            Copyright 01/29/01 Sun Microsystems, Inc. All Rights Reserved.
            Printed in the United States of America.
2550 Garcia Avenue, Mountain View, California, 94043-1100 U.S.A.

This product and related documentation is protected by 
copyright and distributed under licenses restricting its use, copying, 
distribution and decompilation.  No part of this product or related 
documentation may be reproduced in any form by any means without prior 
written authorization of Sun and its licensors, if any.

Portions of this product may be derived from the UNIX(R) and Berkeley 4.3 BSD 
systems, licensed from UNIX Systems Laboratories, Inc. and the University of 
California, respectively.  Third party font software in this product is
protected by copyright and licensed from Sun's Font Suppliers. 
  
RESTRICTED RIGHTS LEGEND:  Use, duplication, or disclosure by the government 
is subject to restrictions as set forth in subparagraph (c)(1)(ii) of the
Rights in Technical Data and Computer Software clause at DFARS 252.227-7013
and FAR 52.227-19.
 
Sun, Sun Microsystems, the Sun Logo, Solaris, SunOS, ONC, NFS, OpenWindows,
DeskSet, AnswerBook, SunLink, SunView, SunDiag, NeWS, OpenBoot, 
OpenFonts, SunInstall, SunNet, ToolTalk, X11/NeWS and XView are trademarks or 
registered trademarks of Sun Microsystems, Inc.  UNIX and OPEN LOOK are 
registered trademarks of UNIX System Laboratories, Inc. PostScript is a 
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All SPARC trademarks, including the SCD Compliant Logo, are trademarks or 
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The OPEN LOOK(R) and Sun(TM) Graphical User Interfaces were developed by 
Sun Microsystems, Inc. for its users and licensees.  Sun acknowledges the 
pioneering efforts of Xerox in researching and developing the concept of 
visual or graphical user interfaces for the computer industry.  Sun holds 
a non-exclusive license from Xerox to the Xerox Graphical User Interface, 
which license also covers Sun's licensees who implement OPEN LOOK GUIs and 
otherwise comply with Sun's written license agreements.

The X Window System is a product of the Massachusetts Institute of Technology.

This product incorporates technology used under license from Fulcrum Technology.

OSILOGIE and OSIAM_C are trademarks of Marben Produit.
